Small vacuum plasma device(PR60L , PR80L)
High precision, fast response, good handling and compatibility, perfect functions and professional technical support.
Small vacuum plasma device(PR60L , PR80L)
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Number |
Project |
Technical Parameter |
|
1 |
Specifications of the whole machine |
PR60L:920mm(W) × 960mm(D) × 1720mm(H) PR80L:920mm(W) ×1030mm(D)×1720mm(H) |
|
2 |
Vacuum chamber specifications |
PR60L: Imported aluminum400(W) ×400(H)×400(D)mm PR80L: Imported aluminum450(W) ×400(H)×450(D)mm |
|
3 |
Electrode plate specifications |
PR60L:6 layer flat plate electrode plate (380(W)×310(D)mm) PR80L:8 layer flat plate electrode plate (420(W)×360(D)mm) |
|
4 |
Control system |
Touch screen + PLC control |
|
5 |
Vacuum measurement system |
Pirani resistance vacuum gauge |
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6 |
Gas metering system |
Precision mass flow control meterMFC |
|
7 |
Number of gas pathways |
2 channels intake, 1 way venting |
|
8 |
Plasma generator |
500W&1KWPlasma generation source,40KHz (selectable13.56MHz) |
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9 |
Working gases |
2 working gases are optional:Ar2、N2、H2、O2 |
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Features |
High precision, fast response, good handling and compatibility, perfect functions and professional technical support. |
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|
Industry |
It is suitable for cameras and industries, mobile phone manufacturing, semiconductor IC fields, silica gel, plastics, polymer fields, automotive electronics industry, aviation industry, etc. |
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Application |
1. Camera and fingerprint recognition industry: Oxidation removal on the surface of the gold PAD of the soft hard bonding board; IR surface cleaning and cleansing; 2. In the field of semiconductor ICs, COB, COG, COF, ACF processes are used for cleaning before wire bonding and soldering; 3. Silicone, plastic, and polymer fields: Surface roughening, etching, and activation of silicone, plastic, and polymer. |
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